Jonas is a Ph.D. candidate in the Chemistry Department at the 乐播传媒 at Boulder. He is a member of the Steven George Group in the Chemistry Department and also has a co-advisor, Victor Bright, in the Mechanical Engineering Department. His research is focused on 听Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) and their applications for MEMS devices. Jonas received his B.S. in Chemistry and Physics from Wisconsin Lutheran College in Milwaukee, WI in 2012. His undergraduate research focused on ozone for sensor and potable water applications. In his free time he enjoys snowboarding, biking, hiking, volleyball, and hanging out with his dog, Einstein.
Publications:
- Articles:
SF4听as the Fluorination Reactant for Al2O3听and VO2听Thermal Atomic Layer Etching
Jonas Gertsch 路 Austin Cano 路 Victor Bright听 路 Steven George
Submitted to Chemistry of Materials
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Electrical and Thermal Conduction in Ultra-thin Freestanding Atomic Layer Deposited W Nanobridges
Nathan T Eigenfeld 路 Jonas C Gertsch 路 George D Skidmore 路 Steven M George 路 Victor M. Bright
Oct 2015 路 Nanoscale
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Hemispherical micro-resonators from atomic layer deposition
Jason M Gray 路 John P Houlton 路 Jonas C Gertsch 路 Joseph J Brown 路 Charles T Rogers 路 Steven M George 路 Victor M Bright
Dec 2014 路 Journal of Micromechanics and Microengineering
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GaN nanowire coated with atomic layer deposition of tungsten: A probe for near-field scanning microwave microscopy
Joel C Weber 路 Paul T Blanchard 路 Aric W Sanders 路 Jonas C Gertsch 路 Steven M George 路 Samuel Berweger 路 Atif Imtiaz 路 Kevin J Coakley 路 Thomas M Wallis 路 Kris A Bertness 路 Pavel Kabos 路 Norman A Sanford 路 Victor M Bright
Sep 2014 路 Nanotechnology
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- Conference Papers:
First Transistor Demonstration of Thermal Atomic Layer Etching: InGaAs FinFETs with Sub-5nm Fin-Width Featuring In-Situ ALE-ALD
Wenjie Lu 路 Younghee Lee 路 Jessica Murdzek 路听Jonas Gertsch 路 Alon Vardi 路 Lisa Kong 路 Steven George 路 Jesus del Alamo
Dec 2018 路 Contributed Paper: 2018听IEEE International Electron Devices Meeting (IEDM)
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Thermal Atomic Layer Etching of VO2听Using Sequential Exposures of SF4听and Either Sn(acac)2听or BCl3
Jonas Gertsch听路 Victor Bright听路 Steven George
Oct 2017听路 Contributed Oral: AVS 64th International Symposium & Exhibition
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SF4听as a New Fluorine Reagent for Thermal ALE: Application to Al2O3听and VO2听ALE
Jonas Gertsch听路 Victor Bright听路 Steven George
July 2017听路 Contributed Poster: ALD/ALE 2017-听17th International Conference on Atomic Layer Deposition
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Design, fabrication, and characterization of a micromachined glass-blown spherical resonator with insitu integrated silicon electrodes and ALD tungsten interior coating
Joan Giner 路 Jason M. Gray 路 Jonas Gertsch 路 Victor M. Bright 路 Andrei M. Shkel
Feb 2015 路 Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
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Effect of Film Stress on the Shape of Nanostructures Grown Using Atomic Layer Deposition
Jonas C Gertsch 路 Nathan Eigenfeld 路 Jason Gray 路 Joseph Brown 路 Victor Bright 路 Steven George
American Vacuum Society International Symposium路 Nov 2014
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