Instrument/ServiceType:
Mask Aligner and Exposer
Make/ Model:
Karl Suss MJB 3
Instrument Description:
Used in photolithography. Aligns masks to existing structures on a wafer and exposes the photo-resist to transfer the mask design.
Keywords for the Instrument:
Photolithography, Mask, UV
Instrument Website URL:
Primary Contact Name:
David Alchenberger
Email: alchenbd@jila.colorado.edu
Phone 303.492.2389
Home Department/Institute:
JILA
Home Facility:
JILA Keck Lab
Instrument Location:
JILA X121B
Instrument Availability to Campus Users:
Open on a case-by-case basis to the university users outside of the home department
Instrument Availability to External Academic and National Lab Users:
Open on a case-by-case basis to academic and national lab users