Instrument/ServiceType:
Evaporator, Sputterer, and CVD
Instrument Description:
Various thin-film deposition tools, including PVD (e-beam & thermal evaporators, DC & RF magnetron (reactive) sputterers) and CVD (APCVD of graphene, Si oxidation, PECVD of SiO2 and SiNx).
Available sputter targets:
Indium Tin Oxide(ITO), Indium Zinc Oxide (IZO), Tungsten (W), Tantalum (Ta), Copper (Cu), Aluminum (Al), Chromium (Cr), ZincOxide (ZnO), Silicon (Si), SiliconCarbide(SiC), Titanium (Ti), Molybdenum (Mo), Zirconium (Zr), Tantalumcarbide (TaC), AlN, Al2O3, Cu2O, TaN, Ta2O5, WO3.
Primary Contact:
Tzu-Min Ou
Email id:听cnl@colorado.edu
Instrument Location:
Engineering Center, ECEE220
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